Advances in Low Temperature RF Plasmas. Basis for Process Design
by T. Makabe
2002328 pages
Elsevier Publishing Company·1 editions
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Advances in Low Temperature RF Plasmas. Basis for Process Design (2002)
Advances in Low Temperature RF Plasmas. Basis for Process Design (2002)
Elsevier Publishing Company
Elsevier Publishing Company
Hardcover
ISBN 10: 0444510958
ISBN 13: 9780444510952